1988 International Conference on Solid State Devices and Materials

1988 International Conference on Solid State Devices and Materials

1988年8月24日〜8月26日Keio Plaza Hotel, Tokyo, Japan
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International Conference on Solid State Devices and Materials
1988 International Conference on Solid State Devices and Materials

1988 International Conference on Solid State Devices and Materials

1988年8月24日〜8月26日Keio Plaza Hotel, Tokyo, Japan

[A-7-2]Annealing of Defects by High Energy Ion Implantation

Yoshiko NIKI、Soichi NADAHARA、Masaharu WATANABE(1.ULSI Research Center, Toshiba Co.)
https://doi.org/10.7567/SSDM.1988.A-7-2
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