1988 International Conference on Solid State Devices and Materials

1988 International Conference on Solid State Devices and Materials

1988年8月24日〜8月26日Keio Plaza Hotel, Tokyo, Japan
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International Conference on Solid State Devices and Materials
1988 International Conference on Solid State Devices and Materials

1988 International Conference on Solid State Devices and Materials

1988年8月24日〜8月26日Keio Plaza Hotel, Tokyo, Japan

[A-9-6]Characterization of Silicon Bipolar Devices Fabricated Using Very-Low-Temperature Plasma Process

Tadashi SAITOH、Masao KONDO、Tsuyoshi UEMATSU、Masao TAMURA(1.Central Research Laboratory, Hitachi, Ltd.)
https://doi.org/10.7567/SSDM.1988.A-9-6
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