1988 International Conference on Solid State Devices and Materials

1988 International Conference on Solid State Devices and Materials

1988年8月24日〜8月26日Keio Plaza Hotel, Tokyo, Japan
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International Conference on Solid State Devices and Materials
1988 International Conference on Solid State Devices and Materials

1988 International Conference on Solid State Devices and Materials

1988年8月24日〜8月26日Keio Plaza Hotel, Tokyo, Japan

[C-1-2]High Crystalline Quality Si Film Formation on Lattice-matched Mixed Oxide (SrxBa1-xO)/Si(111) Stacked Structure

Yuichi Kado、Yoshinobu Arita(1.NTT LSI Laboratory)
https://doi.org/10.7567/SSDM.1988.C-1-2
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