1989 Conference on Solid State Devices and Materials

1989 Conference on Solid State Devices and Materials

1989年8月28日〜8月30日Nippon Toshi Center, Tokyo, Japan
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International Conference on Solid State Devices and Materials
1989 Conference on Solid State Devices and Materials

1989 Conference on Solid State Devices and Materials

1989年8月28日〜8月30日Nippon Toshi Center, Tokyo, Japan

[A-1-1]Thermally Stable TiSi2 Thin Films by Modification in Interface and Surface Structures

A. Ohsaki、J. Komori、T. Katayama、M. Shimizu、T. Okamoto、H. Kotani、S. Nagao(1.LSI Research and Development Laboratory Mitsubishi Electric Corporation)
https://doi.org/10.7567/SSDM.1989.A-1-1
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