1989 Conference on Solid State Devices and Materials

1989 Conference on Solid State Devices and Materials

1989年8月28日〜8月30日Nippon Toshi Center, Tokyo, Japan
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International Conference on Solid State Devices and Materials
1989 Conference on Solid State Devices and Materials

1989 Conference on Solid State Devices and Materials

1989年8月28日〜8月30日Nippon Toshi Center, Tokyo, Japan

[A-2-2]Electromigration Induced Abrupt Change of Electrical Resistance in Aluminum Interconnection

Shoso Shingubara、Hisashi Kaneko、Makoto Saitoh(1.Toshiba ULSI Research Center, Toshiba R&D Center、2.Tokyo Institute of Technology)
https://doi.org/10.7567/SSDM.1989.A-2-2
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