1989 Conference on Solid State Devices and Materials

1989 Conference on Solid State Devices and Materials

1989年8月28日〜8月30日Nippon Toshi Center, Tokyo, Japan
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International Conference on Solid State Devices and Materials
1989 Conference on Solid State Devices and Materials

1989 Conference on Solid State Devices and Materials

1989年8月28日〜8月30日Nippon Toshi Center, Tokyo, Japan

[A-5-2]A New Dielectric Isolation Technology Using Molten Silicon Spin Deposition

S. Itoh、S. Tanabe、T. Usui、K. Akahane、E. Fujya、Y. Tahara、Y. Maeda(1.Electronic Devices Group, Oki Electric Industry Co., Ltd.、2.Hoxan Research Laboratories, Hoxan Corporation)
https://doi.org/10.7567/SSDM.1989.A-5-2
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