1989 Conference on Solid State Devices and Materials

1989 Conference on Solid State Devices and Materials

1989年8月28日〜8月30日Nippon Toshi Center, Tokyo, Japan
International Conference on Solid State Devices and Materials
1989 Conference on Solid State Devices and Materials

1989 Conference on Solid State Devices and Materials

1989年8月28日〜8月30日Nippon Toshi Center, Tokyo, Japan

[A-7-4]Substrate Engineering for VTH-Scaling at Low Supply Voltage (1.5-3 V) in ULSIs

Ryuichi Izawa、Digh Hisamoto、Eiji Takeda(1.Central Research Laboratory, Hitachi Ltd.)
https://doi.org/10.7567/SSDM.1989.A-7-4