1989 Conference on Solid State Devices and Materials

1989 Conference on Solid State Devices and Materials

1989年8月28日〜8月30日Nippon Toshi Center, Tokyo, Japan
戻る
International Conference on Solid State Devices and Materials
1989 Conference on Solid State Devices and Materials

1989 Conference on Solid State Devices and Materials

1989年8月28日〜8月30日Nippon Toshi Center, Tokyo, Japan

[B-2-3]A Study of Nucleation and Grain Growth in Silicon Implanted a-Silicon Films

Shigeru Kambayashi、Shinji Onga、Ichiro Mizushima、Katsuhiko Higuchi、Hiroshi Kuwano(1.ULSI Research Center, Toshiba Corporation、2.Faculty of Science and Technology, Keio University)
https://doi.org/10.7567/SSDM.1989.B-2-3
PDFダウンロードPDFダウンロード
戻る