1989 Conference on Solid State Devices and Materials

1989 Conference on Solid State Devices and Materials

1989年8月28日〜8月30日Nippon Toshi Center, Tokyo, Japan
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International Conference on Solid State Devices and Materials
1989 Conference on Solid State Devices and Materials

1989 Conference on Solid State Devices and Materials

1989年8月28日〜8月30日Nippon Toshi Center, Tokyo, Japan

[B-2-6]Chemical State and Diffusion Behavior of As in Arsenosilicate Glass (AsSG)

Yoshitaka TSUNASHIMA、Takako OKADA、Hideichi KAWAGUCHI、Shinji ONGA、Kikuo YAMABE(1.ULSI Research Center, TOSHIBA Co.)
https://doi.org/10.7567/SSDM.1989.B-2-6
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