1991 International Conference on Solid State Devices and Materials

1991 International Conference on Solid State Devices and Materials

1991年8月27日〜8月29日Pacifico Yokohama, Yokohama, Japan
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International Conference on Solid State Devices and Materials
1991 International Conference on Solid State Devices and Materials

1991 International Conference on Solid State Devices and Materials

1991年8月27日〜8月29日Pacifico Yokohama, Yokohama, Japan

[A-2-5]Strain Evaluation at the Si/SiO2 Interface Using ER Method

Pornchai YONGWATTANASOONTORN、Hitoshi KUBO、Masato MORIFUJI、Kenji TANIGUCHI、Chihiro HAMAGUCHI Keitaro IMAI(1.Department of Electronic Engineering, Osaka University、2.ULSI Research center, Toshiba Corporation)
https://doi.org/10.7567/SSDM.1991.A-2-5
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