[A-3-1]In-Situ Observation of Electromigration in Cu Film with Scanning μ-RHEED Microscope
Kazuya Masu、Yohei Hiura、Kazuo Tsubouchi、Tadahiro Ohmi、Nobuo Mikoshiba(1.Research Institute of Electrical Communication, Tohoku University、2.Department of Electronics, Faculty of Engineering, Tohoku University)
