1991 International Conference on Solid State Devices and Materials

1991 International Conference on Solid State Devices and Materials

1991年8月27日〜8月29日Pacifico Yokohama, Yokohama, Japan
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International Conference on Solid State Devices and Materials
1991 International Conference on Solid State Devices and Materials

1991 International Conference on Solid State Devices and Materials

1991年8月27日〜8月29日Pacifico Yokohama, Yokohama, Japan

[B-2-4]The Effects of Hot Ion-Implantation on the Electrical Properties of Amorphous-Silicon Films Produced by CVD Method

Tsutomu SATOH、Hiroshi KANOH、Osamu SUGIURA、Masakiyo MATSUMURA(1.Department of Physical Electronics, Tokyo Institute of Technology)
https://doi.org/10.7567/SSDM.1991.B-2-4
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