1992 International Conference on Solid State Devices and Materials

1992 International Conference on Solid State Devices and Materials

1992年8月26日〜8月28日Tsukuba Center Building, Tsukuba, Japan
International Conference on Solid State Devices and Materials
1992 International Conference on Solid State Devices and Materials

1992 International Conference on Solid State Devices and Materials

1992年8月26日〜8月28日Tsukuba Center Building, Tsukuba, Japan

[A-1-2]Low-Temperature (625℃) Silicon Epitaxial Growth on Silicon Substrates Heated-Up in SiH4 Atmosphere

K. Kobayashi、K. Fukumoto、T. Katayama、T. Higaki、H. Abe(1.LSI Laboratory, Mitsubishi Electric Corp.)
https://doi.org/10.7567/SSDM.1992.A-1-2