[A-1-4]Lateral Solid Phase Epitaxy of Amorphous Si Films under Ultrahigh Pressure
H. Ishiwara、H. Wakabayashi、K. Miyazaki、K. Fukao、A. Sawaoka(1.Precision and Intelligence Laboratory, Tokyo Institute of Technology、2.Canon Inc., R/D、3.Kanagawa works Hitachi Ltd.、4.Engineering Materials Laboratory, Tokyo Institute of Technology)
