1992 International Conference on Solid State Devices and Materials

1992 International Conference on Solid State Devices and Materials

1992年8月26日〜8月28日Tsukuba Center Building, Tsukuba, Japan
International Conference on Solid State Devices and Materials
1992 International Conference on Solid State Devices and Materials

1992 International Conference on Solid State Devices and Materials

1992年8月26日〜8月28日Tsukuba Center Building, Tsukuba, Japan

[A-1-4]Lateral Solid Phase Epitaxy of Amorphous Si Films under Ultrahigh Pressure

H. Ishiwara、H. Wakabayashi、K. Miyazaki、K. Fukao、A. Sawaoka(1.Precision and Intelligence Laboratory, Tokyo Institute of Technology、2.Canon Inc., R/D、3.Kanagawa works Hitachi Ltd.、4.Engineering Materials Laboratory, Tokyo Institute of Technology)
https://doi.org/10.7567/SSDM.1992.A-1-4