1992 International Conference on Solid State Devices and Materials

1992 International Conference on Solid State Devices and Materials

1992年8月26日〜8月28日Tsukuba Center Building, Tsukuba, Japan
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International Conference on Solid State Devices and Materials
1992 International Conference on Solid State Devices and Materials

1992 International Conference on Solid State Devices and Materials

1992年8月26日〜8月28日Tsukuba Center Building, Tsukuba, Japan

[PA1-4]Nanometer Resolution Measurement of Dielectric Breakdown of Silicon Dioxide Films with AFM/STM

Yoshinobu FUKANO、Yasuhiro SUGAWARA、Seizo MORITA、Yoshiki YAMANISHI、Takahiko OASA(1.Department of Physics, Faculty of Science, Hiroshima University、2.Advanced Technology Research Labs., Sumitomo Metal Industries, Ltd.)
https://doi.org/10.7567/SSDM.1992.PA1-4
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