[S-I-8-1]Electron-Beam Induced Etching as a Key Process in Through-Vacuum Fabrication of GaAs-AlGaAs Nanoheterostructures
Yoshifumi KATAYAMA、Tomonori ISHIKAWA、Nobuyuki TANAKA、Maximo LOPEZ、Isamu MATSUYAMA、Yuichi IDE、Masamichi YAMADA(1.Opotelectronics Technology Research Laboratory (OTL))
