1995 International Conference on Solid State Devices and Materials

1995 International Conference on Solid State Devices and Materials

1995年8月21日〜8月24日International House, Osaka, Japan
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International Conference on Solid State Devices and Materials
1995 International Conference on Solid State Devices and Materials

1995 International Conference on Solid State Devices and Materials

1995年8月21日〜8月24日International House, Osaka, Japan

[S-I-1-5]Observation of Oxide Thickness Dependent Interface Roughness in Si MOS Structure

Junji KOGA、Shin-ichi TAKAGI、Akira TORIUMI(1.ULSI Research Laboratories, Toshiba Corporation)
https://doi.org/10.7567/SSDM.1995.S-I-1-5
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