1995 International Conference on Solid State Devices and Materials

1995 International Conference on Solid State Devices and Materials

1995年8月21日〜8月24日International House, Osaka, Japan
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International Conference on Solid State Devices and Materials
1995 International Conference on Solid State Devices and Materials

1995 International Conference on Solid State Devices and Materials

1995年8月21日〜8月24日International House, Osaka, Japan

[S-I-4-2]Application of CVD SiO2 Single Layer Films to Inter-Poly Dielectrics of Flash Memories

T. Kobayashi、M. Ushiyama、N. Miyamoto、J. Yugami、H. Kume、K. Kimura(1.Central Research Laboratory, Hitachi, Ltd.、2.Hitachi Device Engineering Co.)
https://doi.org/10.7567/SSDM.1995.S-I-4-2
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