1995 International Conference on Solid State Devices and Materials

1995 International Conference on Solid State Devices and Materials

1995年8月21日〜8月24日International House, Osaka, Japan
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International Conference on Solid State Devices and Materials
1995 International Conference on Solid State Devices and Materials

1995 International Conference on Solid State Devices and Materials

1995年8月21日〜8月24日International House, Osaka, Japan

[S-I-4-3]Investigation of Interlayer Dielectric Material Influence on DRAM Retention Time

M. Ohishi、K. Matsui、K. Koyama(1.ULSI Device Development Laboratories, NEC Corporation)
https://doi.org/10.7567/SSDM.1995.S-I-4-3
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