1995 International Conference on Solid State Devices and Materials

1995 International Conference on Solid State Devices and Materials

1995年8月21日〜8月24日International House, Osaka, Japan
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International Conference on Solid State Devices and Materials
1995 International Conference on Solid State Devices and Materials

1995 International Conference on Solid State Devices and Materials

1995年8月21日〜8月24日International House, Osaka, Japan

[S-IV-4]W as a BIT Line Interconnection in COB Structured DRAM and Feasible Diffusion Barrier Layer

Jeong Soo Byun、Jun Ki Kim、Jin Won Park、Jae Jeong Kim(1.ULSI Laboratory of LG Semicon Co. Ltd.)
https://doi.org/10.7567/SSDM.1995.S-IV-4
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