[A-3-1]Metal CVD Technology for ULSI Applications: The Aluminum Route
Andreas KNORR、Jonathan FALTERMEIER、Robert TALEVI、Heidi GUNDLACH、Kaushik Arun KUMAR、Gregory G. PETERSON、Alain E. KALOYEROS(1.New York State Center for Advanced Thin Film Technology and Department of Physics, the University at Albany-SUNY)
