1996 International Conference on Solid State Devices and Materials

1996 International Conference on Solid State Devices and Materials

1996年8月26日〜8月29日Pacifico Yokohama, Yokohama, Japan
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International Conference on Solid State Devices and Materials
1996 International Conference on Solid State Devices and Materials

1996 International Conference on Solid State Devices and Materials

1996年8月26日〜8月29日Pacifico Yokohama, Yokohama, Japan

[A-5-2]Anomalous Junction Leakage Behavior of Ti-SALICIDE Contacts on Ultra-Shallow Junctions

Atsuko SAKATA、Masato KOYAMA、Haruko AKUTSU、Iwao KUNISHIMA、Mitsuo KOIKE、Mitsuhiro TOMITA(1.Microelectronics Engineering Laboratory, ULSI Research Laboratories, Environmental Engineering Laboratory, TOSHIBA Corporation)
https://doi.org/10.7567/SSDM.1996.A-5-2
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