1996 International Conference on Solid State Devices and Materials

1996 International Conference on Solid State Devices and Materials

1996年8月26日〜8月29日Pacifico Yokohama, Yokohama, Japan
International Conference on Solid State Devices and Materials
1996 International Conference on Solid State Devices and Materials

1996 International Conference on Solid State Devices and Materials

1996年8月26日〜8月29日Pacifico Yokohama, Yokohama, Japan

[B-1-2]Effects of Cleavage on Local Cross-Sectional Stress Distribution in Trench Isolation Structure

Atsushi YAGISHITA、Tomohiro SAITO、Satoshi MATSUDA、Yukihiro USHIKU(1.Microelectronics Engineering Laboratories, Toshiba Corporation)
https://doi.org/10.7567/SSDM.1996.B-1-2