1996 International Conference on Solid State Devices and Materials

1996 International Conference on Solid State Devices and Materials

1996年8月26日〜8月29日Pacifico Yokohama, Yokohama, Japan
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International Conference on Solid State Devices and Materials
1996 International Conference on Solid State Devices and Materials

1996 International Conference on Solid State Devices and Materials

1996年8月26日〜8月29日Pacifico Yokohama, Yokohama, Japan

[B-1-3]RIE-Lag Reduction by NH3 Addition in Aluminum Alloy Etching under BCl3/Cl2 Chemistry

Michinari YAMANAKA、Hideo NAKAGAWA、Masafumi KUBOTA(1.Semiconductor Research Center, Matsushita Electric Industrial Co., Ltd.)
https://doi.org/10.7567/SSDM.1996.B-1-3
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