1996 International Conference on Solid State Devices and Materials

1996 International Conference on Solid State Devices and Materials

1996年8月26日〜8月29日Pacifico Yokohama, Yokohama, Japan
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International Conference on Solid State Devices and Materials
1996 International Conference on Solid State Devices and Materials

1996 International Conference on Solid State Devices and Materials

1996年8月26日〜8月29日Pacifico Yokohama, Yokohama, Japan

[B-1-4]Double Spacer LOCOS Process with Shallow Recess of Silicon for 0.20 μm Isolation

Byung-Jin Cho、Se-Aug Jang、Tae-Sik Song、Seung-Ho Pyi、Jong-Choul Kim(1.Memory R&D Div., HYUNDAI Electronics Ind. Co. Ltd.)
https://doi.org/10.7567/SSDM.1996.B-1-4
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