1997 International Conference on Solid State Devices and Materials

1997 International Conference on Solid State Devices and Materials

1997年9月16日〜9月19日ACT CITY Hamamatsu, Hamamatsu, Japan
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International Conference on Solid State Devices and Materials
1997 International Conference on Solid State Devices and Materials

1997 International Conference on Solid State Devices and Materials

1997年9月16日〜9月19日ACT CITY Hamamatsu, Hamamatsu, Japan

[A-2-1]Highly Reliable SiO2 Films Formed by UV-O2 Oxidation

Akinobu Teramoto、Kiyoteru Kobayashi、Yoshikazu Ohno、Makoto Hirayama(1.Mitsubishi Electric Corporation, ULSI Laboratory)
https://doi.org/10.7567/SSDM.1997.A-2-1
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