1997 International Conference on Solid State Devices and Materials

1997 International Conference on Solid State Devices and Materials

1997年9月16日〜9月19日ACT CITY Hamamatsu, Hamamatsu, Japan
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International Conference on Solid State Devices and Materials
1997 International Conference on Solid State Devices and Materials

1997 International Conference on Solid State Devices and Materials

1997年9月16日〜9月19日ACT CITY Hamamatsu, Hamamatsu, Japan

[B-2-3]Fine-Grained SrBi2Ta2O9 Thin Films by Low Temperature Annealing

Nobuhito OGATA、Yasuyuki ITO、Kazuya ISHIHARA、Masaya NAGATA、Hitoshi URASHIMA、Akira OKUTOH、Shinobu YAMAZAKI、Shun MITARAI、Jun KUDO(1.Functional Devices Laboratories, Sharp Corporation)
https://doi.org/10.7567/SSDM.1997.B-2-3
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