1997 International Conference on Solid State Devices and Materials

1997 International Conference on Solid State Devices and Materials

1997年9月16日〜9月19日ACT CITY Hamamatsu, Hamamatsu, Japan
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International Conference on Solid State Devices and Materials
1997 International Conference on Solid State Devices and Materials

1997 International Conference on Solid State Devices and Materials

1997年9月16日〜9月19日ACT CITY Hamamatsu, Hamamatsu, Japan

[B-2-5]New Low Temperature Processing of MOCVD-Bi4Ti3O12 Thin Films Using BiOx Buffer Layer

Takeshi KIJIMA、Maho USHIKUBO、Hironori MATSUNAGA(1.Functional Devices Laboratories, SHARP Corporation)
https://doi.org/10.7567/SSDM.1997.B-2-5
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