1998 International Conference on Solid State Devices and Materials

1998 International Conference on Solid State Devices and Materials

1998年9月7日〜9月10日International Conference Center Hiroshima, Hiroshima, Japan
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International Conference on Solid State Devices and Materials
1998 International Conference on Solid State Devices and Materials

1998 International Conference on Solid State Devices and Materials

1998年9月7日〜9月10日International Conference Center Hiroshima, Hiroshima, Japan

[B-2-5]Conformal Step Coverage of (Ba, Sr)TiO3 Films Prepared by Liquid Source CVD Using Ti(t-BuO)2(DPM)2

Takaaki Kawahara、Shigeru Matsuno、Mikio Yamamuka、Masayoshi Tarutani、Takehiko Sato、Tsuyoshi Horikawa、Fusaoki Uchikawa、Kouichi Ono(1.Advance Technology R & D Center, Mitsubishi Electric Corporation)
https://doi.org/10.7567/SSDM.1998.B-2-5
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