2000 International Conference on Solid State Devices and Materials

2000 International Conference on Solid State Devices and Materials

2000年8月29日〜8月31日Sendai International Center, Sendai, Japan
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International Conference on Solid State Devices and Materials
2000 International Conference on Solid State Devices and Materials

2000 International Conference on Solid State Devices and Materials

2000年8月29日〜8月31日Sendai International Center, Sendai, Japan

[A-1-6]Aluminum Chemical Vapor Deposition Technology for High Deposition Rate and Surface Morphology Improvement

Chang-Hun Lee、Takamasa Nishimura、Kazuya Masu、Kazuo Tsubouchi(1.Research Institute of Electrical Communication, Tohoku University)
https://doi.org/10.7567/SSDM.2000.A-1-6
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