2000 International Conference on Solid State Devices and Materials

2000 International Conference on Solid State Devices and Materials

2000年8月29日〜8月31日Sendai International Center, Sendai, Japan
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International Conference on Solid State Devices and Materials
2000 International Conference on Solid State Devices and Materials

2000 International Conference on Solid State Devices and Materials

2000年8月29日〜8月31日Sendai International Center, Sendai, Japan

[A-1-7]Novel Nozzle-Scan Coating Method for Low-k Films

R. Nakata、N. Yamada、A. Kajita、S. Ito、K. Okumura、T. Kitano、M. Morikawa、K. Takeshita、Y. Esaki、M. Akimoto(1.PROCESS & MANUFACTURING ENGINEERING CENTER, TOSHIBA CORPORATION、2.SYSTEM LSI DEVELOPMENT CENTER, TOSHIBA CORPORATION、3.R&D Dept., Tokyo Electron Kyushu Ltd.)
https://doi.org/10.7567/SSDM.2000.A-1-7
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