2000 International Conference on Solid State Devices and Materials

2000 International Conference on Solid State Devices and Materials

2000年8月29日〜8月31日Sendai International Center, Sendai, Japan
戻る
International Conference on Solid State Devices and Materials
2000 International Conference on Solid State Devices and Materials

2000 International Conference on Solid State Devices and Materials

2000年8月29日〜8月31日Sendai International Center, Sendai, Japan

[A-2-6]Evaluation of PECVD a-SiC:H as a Cu Diffusion Barrier Layer of Cu Dual Damascene Process

Soo Gun Lee、Hyeok-Sang Oh、Hong-Jae Shin、Jin-Gi Hong、Hyeon-Deok Lee、Hokyu Kang(1.Process Development Team, Semiconductor R&D center, Samsung Electronics)
https://doi.org/10.7567/SSDM.2000.A-2-6
PDFダウンロードPDFダウンロード
戻る