2001 International Conference on Solid State Devices and Materials

2001 International Conference on Solid State Devices and Materials

2001年9月26日〜9月28日Diamond Hotel, Tokyo, Japan
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International Conference on Solid State Devices and Materials
2001 International Conference on Solid State Devices and Materials

2001 International Conference on Solid State Devices and Materials

2001年9月26日〜9月28日Diamond Hotel, Tokyo, Japan

[A-2-2]Spin-Drying with CO2 Gas Purge for 0.13 μm DRAM's Contact Process

Yoshihiro Ogawa、Hisashi Okuchi、Hiroshi Tomita、Kunihiro Miyazaki、Kazuhiko Takase、Soichi Nadahara(1.Process and Manufacturing Engineering center., Toshiba Corp. Semiconductor company)
https://doi.org/10.7567/SSDM.2001.A-2-2
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