[B-1-4]Impact of Hf metal pre-deposition in CVD- and PVD-HfO2 dielectrics
Kazuhiko Yamamoto、Masayuki Asai、Shigenori Hayashi、Sadayoshi Horii、Masaaki Niwa、Hironobu Miya(1.ULSI Process Technology Development Center, Matsushita Electric Industrial Co., Ltd.、2.Semiconductor equipment system laboratory, Hitachi Kokusai Electric Inc.)
