2002 International Conference on Solid State Devices and Materials

2002 International Conference on Solid State Devices and Materials

2002年9月17日〜9月19日Nagoya Congress Center, Nagoya, Japan
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International Conference on Solid State Devices and Materials
2002 International Conference on Solid State Devices and Materials

2002 International Conference on Solid State Devices and Materials

2002年9月17日〜9月19日Nagoya Congress Center, Nagoya, Japan

[B-2-3]Effect of TEOS treatment on the properties of periodic nanoporous silica low-k film

Yoshiaki Oku、Kazuhiro Yamada、Norikazu Nishiyama、Shunsuke Tanaka、Korekazu Ueyama、Nobuhiro Hata、Takamaro Kikkawa(1.MIRAI Project, ASET、2.Graduate School of Engineering Science, Osaka University、3.MIRAI Project, ASRC, AIST、4.RCNS, Hiroshima University)
https://doi.org/10.7567/SSDM.2002.B-2-3
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