2005 International Conference on Solid State Devices and Materials

2005 International Conference on Solid State Devices and Materials

2005年9月12日〜9月15日International Conference Center Kobe, Kobe, Japan
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International Conference on Solid State Devices and Materials
2005 International Conference on Solid State Devices and Materials

2005 International Conference on Solid State Devices and Materials

2005年9月12日〜9月15日International Conference Center Kobe, Kobe, Japan

[A-2-2]Exact Trap Level Estimation of HfSiON Films with Various Atomic Compositions

Masahiro Koike、Tsunehiro Ino、Yuuichi Kamimuta、Yuichiro Mitani、Akira Nishiyama(1.Advanced LSI Technology Laboratory, Corporate Research&Development Center, Toshiba Corporation)
https://doi.org/10.7567/SSDM.2005.A-2-2
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