2005 International Conference on Solid State Devices and Materials

2005 International Conference on Solid State Devices and Materials

2005年9月12日〜9月15日International Conference Center Kobe, Kobe, Japan
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International Conference on Solid State Devices and Materials
2005 International Conference on Solid State Devices and Materials

2005 International Conference on Solid State Devices and Materials

2005年9月12日〜9月15日International Conference Center Kobe, Kobe, Japan

[A-3-1]Dielectric Constant Behavior of Hf-O-N System

Tsunehiro Ino、Yuuichi Kamimuta、Masamichi Suzuki、Masato Koyama、Akira Nishiyama(1.Advanced LSI Technology Laboratory, Corporate Research and Development Center, TOSHIBA Corporation)
https://doi.org/10.7567/SSDM.2005.A-3-1
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