2005 International Conference on Solid State Devices and Materials

2005 International Conference on Solid State Devices and Materials

2005年9月12日〜9月15日International Conference Center Kobe, Kobe, Japan
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International Conference on Solid State Devices and Materials
2005 International Conference on Solid State Devices and Materials

2005 International Conference on Solid State Devices and Materials

2005年9月12日〜9月15日International Conference Center Kobe, Kobe, Japan

[A-3-2]Permittivity Enhancement of Hf(1-x)SixO2 Film with High Temperature Annealing

Kazuyuki Tomida、Koji Kita、Akira Toriumi(1.Department of Materials Engineering, School of Engineering, The University of Tokyo)
https://doi.org/10.7567/SSDM.2005.A-3-2
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