2005 International Conference on Solid State Devices and Materials

2005 International Conference on Solid State Devices and Materials

2005年9月12日〜9月15日International Conference Center Kobe, Kobe, Japan
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International Conference on Solid State Devices and Materials
2005 International Conference on Solid State Devices and Materials

2005 International Conference on Solid State Devices and Materials

2005年9月12日〜9月15日International Conference Center Kobe, Kobe, Japan

[A-3-3]Thermal Stability Improvements for HfO2 by Fluorine Implantation

Chao Sung Lai、Woei Cherng Wu、Jer Chyi Wang、Tian Sheng Chao(1.Department of Electronic Engineering, Chang Gung University、2.Department of Electronic Physics, National Chiao Tung University、3.Nanya Technology Corporation)
https://doi.org/10.7567/SSDM.2005.A-3-3
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