2005 International Conference on Solid State Devices and Materials
2005年9月12日〜9月15日International Conference Center Kobe, Kobe, Japan
2005 International Conference on Solid State Devices and Materials
2005年9月12日〜9月15日International Conference Center Kobe, Kobe, Japan
[A-4-1]Nanoscale Observations for Degradation Phenomena in SiO2 and High－k Gate lnsulators Using Conductive－Atomic Force Microscopy
Shigeaki Zaima、Akiyoshi Seko、Yukihiko Watanabe、Toshifumi Sago、Mitsuo Sakashita、Hiroki Kondo、Akira Sakai、Masaki Ogawa(1.Graduate School of Engineering, Nagoya University、2.Toyota Central R＆D Labs., Inc.、3.Center for Cooperative Research in Advanced Science＆Technology, Nagoya University)
