2005 International Conference on Solid State Devices and Materials

2005 International Conference on Solid State Devices and Materials

2005年9月12日〜9月15日International Conference Center Kobe, Kobe, Japan
戻る
International Conference on Solid State Devices and Materials
2005 International Conference on Solid State Devices and Materials

2005 International Conference on Solid State Devices and Materials

2005年9月12日〜9月15日International Conference Center Kobe, Kobe, Japan

[A-6-1]A New Hf-based Dielectric Member, HfLaOx, for Amorphous High-k Gate Insulators in Advanced CMOS

Yoshiki Yamamoto、Koji Kita、Kentaro Kyuno、Akira Toriumi(1.Department of Materials Engineering, School of Engineering, The Univ. of Tokyo)
https://doi.org/10.7567/SSDM.2005.A-6-1
PDFダウンロードPDFダウンロード
戻る