2005 International Conference on Solid State Devices and Materials

2005 International Conference on Solid State Devices and Materials

2005年9月12日〜9月15日International Conference Center Kobe, Kobe, Japan
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International Conference on Solid State Devices and Materials
2005 International Conference on Solid State Devices and Materials

2005 International Conference on Solid State Devices and Materials

2005年9月12日〜9月15日International Conference Center Kobe, Kobe, Japan

[A-9-4]Theoretical analysis of the Fermi level pinning in HfO2/Si system induced by the interface defect states

Minoru Ikeda、Georg Kresse、Toshihide Nabatame、Akira Toriumi(1.MIRAI, Association of Super-Advanced Electronics Technologies (ASET)、2.Institut fur Materialphysik, Univeisitat Wien、3.MIRAI-AIST、4.University of Tokyo)
https://doi.org/10.7567/SSDM.2005.A-9-4
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