2009 International Conference on Solid State Devices and Materials

2009 International Conference on Solid State Devices and Materials

2009年10月6日〜10月9日Sendai Kokusai Hotel, Miyagi, Japan
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International Conference on Solid State Devices and Materials
2009 International Conference on Solid State Devices and Materials

2009 International Conference on Solid State Devices and Materials

2009年10月6日〜10月9日Sendai Kokusai Hotel, Miyagi, Japan

[B-6-3]First LSI Applicable Thin SOI Films Formed by Lateral Solid Phase Epitaxy

H. Ishida1、F. Aiso1、M. Mizukami1、K. Nishihara1、T. Iguchi1、D. Ichinose1、A. Fukumoto1、T. Suzuki1、F. Arai1、I. Mizushima1(1.Toshiba Corp.)
https://doi.org/10.7567/SSDM.2009.B-6-3
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