2013 International Conference on Solid State Devices and Materials
2013年9月24日〜9月27日Hilton Fukuoka Sea Hawk, Fukuoka, Japan
2013 International Conference on Solid State Devices and Materials
2013年9月24日〜9月27日Hilton Fukuoka Sea Hawk, Fukuoka, Japan
[B-4-1]Detection of oxidation-induced compressive stress in Si(100) substrate near the SiO2/Si interface with atomic-scale resolution
T. Suwa1、K. Nagata2、H. Nohira3、K. Nakajima4、A. Teramoto1、A. Ogura2、K. Kimura4、T. Muro5、T. Kinoshita5、S. Sugawa1、T. Hattori1、T. Ohmi1(1.Tohoku Univ.、2.Meiji Univ.、3.Tokyo City Univ.、4.Kyoto Univ.、5.JASRI (Japan))
