[A-1-05] Attainment of low subthreshold slope in planar type inversion channel InGaAs NMOSFET with in-situ deposited Al2O3/Y2O3 as gate dielectrics
〇Lawrence Boyu Young1、Jun Liu1、Yen-Hsun Glen Lin1、Hsien-Wen Wan1、Jueinai Kwo2、Minghwei Hong1(1.National Taiwan Univ.、2.National Tsing Hua Univ.)
