[A-5-01] Enhancement of Ferroelectricity in 5-nm HZO Metal-Ferroelectric-Insulator-Semiconductor Technologies by Using Strained TiN Electrode
〇Cheng-Hung Wu1、Kuan-Chi Wang1、Yu-Yun Wang1、Tian-Li Wu1、Chun-Jung Su2、Yao-Jen Lee2、Chenming Hu1,3(1.National Yang Ming Chiao Tung Univ.、2.Taiwan Semiconductor Research Inst.、3.Univ. California, Berkeley )
