[A-6-10]Contactless Characterization of SiOx/c-Si by FTIR and μ-PCD applied to pMOS Devices
〇Mickael Lozach1、Sommawan Khumpuang1,2、Shiro Hara1,2(1.Minimal Fab Promoting Organization、2.National Institute of Advanced Industrial Science and Technology (AIST))
