Presentation Information
[We-P-50]Low-Temperature Graphene Formation on Si by High-Power Pulsed Sputtering with and without Plasma CVD
*Akihiro Iwata1, Masanori Shinohara1, Takashi Matsumoto2 (1. Dept. of Electrical Engineering, Fukuoka Univ. (Japan), 2. Tokyo Electron Technology Solutions Ltd. (Japan))
Keywords:
high-power pulsed sputtering,graphene,plasma CVD
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