[ptka_mvv] Tu-Poster-B

[Tu-P-49] Integrated Processing for Reversible Control of Ultrathin Oxides

*Chen-Chang Tsao¹, Yi-Yu Pan¹, Chu-Hsiu Hsu², Robert Tseng¹, Sung-Tsun Wang², Yu-Cheng Chang¹, Shih-Chieh Chen², Takashi Kimura³, Yann-Wen Lan⁴, Der-Hsien Lien¹ (1. Institute of Electronics, National Yang Ming Chiao Tung University, Hsinchu, Taiwan (Taiwan), 2. Institute of Pioneer Semiconductor Innovation, National Yang Ming Chiao Tung University, Hsinchu, Taiwan (Taiwan), 3. Department of Physics, Kyushu University, Fukuoka, Japan (Japan), 4. Department of Physics, National Taiwan Normal University, Taipei, Taiwan (Taiwan))

Keywords:

oxide semiconductors,thickness control,top-down process,bottom-up process,doping-free