Presentation Information
[Tu-P-36]Infrared Spectroscopic Analysis of Film Deposition Process during Organosilane Plasma
Atsuya Kuwata1, Yuto Oishi1, Akihiro Iwata1, Ryo Miyazawa2, Fumihiko Hirose2, *Masanori Shinohara1 (1. Fukuoka University (Japan), 2. Yamagata University (Japan))
Keywords:
Infrared spectroscopy,plasma,Si-DLC,deposition process
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